Crystal defect analysis device (non-contact, non-destructive)
Crystal defect analysis device (non-contact, non-destructive)
It is possible to measure without breaking the wafer.
- Company:日本セミラボ 新横浜本社
- Price:Other
1~2 item / All 2 items
Crystal defect analysis device (non-contact, non-destructive)
It is possible to measure without breaking the wafer.
Surface charge analysis device
The surface charge analysis device is ideal for monitoring contamination and damage that occur during processes such as semiconductor front-end management, particularly thermal oxidation films, CVD film formation, metallization, cleaning, and etching.